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THIN FILM, HIGH VACUUM, THIN-FILM DEPOSITION PROCESS. Expert has expertise in many aspects of thin film deposition processes including physical vapor deposition, rf and dc magnetron sputtering, ion beam sputtering, ion-assisted deposition, and chemical vapor deposition (CVD). He developed an ion beam deposition process for very low loss, high reflectivity TiO2/SiO2 mirrors that is used today in manufacturing ring laser gyroscopes. He also developed multilayer coatings for high powered laser optics, silicon solar cells, and combination organic/inorganic protective and anti-reflective multilayer coatings for alkali halide optics. He developed Anti-Reflecting coatings for ophthalmic lenses and mirror coatings for sunwear eyeglasses. He designed several systems while at Honeywell. He is a past and current instructor for the American Vacuum Society Vacuum Technology courses. He designed and built several ultra-high vacuum systems at the University of Wisconsin and Honeywell.

DIAMOND THIN FILM. He pioneered the development of diamond-like coatings in 1980 which led to a technology license to a Japanese company. He managed a group that developed applications for free-standing CVD diamond, especially for thermal management in electronics. This included applications in multichip modules and 3-D (or cube) electronics. The understanding of the limitations and market segments of CVD diamond were important drivers in this applications work.

MULTICHIP MODULE; MULTICHIP MODULE COOLING; MULTICHIP MODULE PACKAGING. He managed a group that developed an advanced thin film copper/polyimide interconnect technology for ceramic multichip module substrates. He led this group to develop the skills to be responsible for the design, test, and manufacture of the complete multichip module. He was responsible for setting up a $2 million captive multichip module facility in an existing IC foundry that would exploit this new technology. He is knowledgeable of electronic packaging, packaging assembly techniques, and test techniques.

CHEMICAL VAPOR DEPOSITION (CVD). He developed processes and deposited films by thermal CVD of silicon on silicon-on-ceramic substrates and by plasma CVD for organic films and diamond-like carbon.

CHIP-ON-BOARD TECHNOLOGY. He managed a group that published papers on component solder failures and plated-through hole failures in laminates for chip-on-board assembly. He assisted Honeywell divisions in designing printed circuit boards for chip-on-board.

SPUTTER DEPOSITION PROCESS; VACUUM DEPOSITION EQUIPMENT; VAPOR DEPOSITION PROCESS. With eight years of hands-on experience, He has gained expertise in developing processes and producing thin films of various metals, oxides, halides, and diamond-like carbon by ion beam sputtering, ion-assisted, e-beam, rf/dc magnetron sputtering, and thermal vacuum deposition processes.

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. He has experience producing diamond-like thin films by ion-beam and plasma CVD processes. He has knowledge of the thermal plasma CVD methods for making films of polycrystalline diamond and the applications and markets for these materials.

DIELECTRIC FILM; EVAPORATED FILM; GAS PLASMA. He has developed processes and produced thin films of oxides, halides, and organic film by various vacuum deposition processes.

GLASS COATING MATERIAL; GLASS METALLIZING. He has produced thin films on glass for anti-reflecting and high reflecting applications by ion beam, e-beam, magnetron sputtering, and thermal deposition methods.

PLASMA POLYMERIZATION. He has eight years of experience developing processes and producing thin films of polyethane and polyethylene by plasma polymerization of the precursor gas in a parallel plate

He has expertise in many aspects of thin film deposition processes including physical vapor deposition, rf and dc magnetron sputtering, ion beam sputtering, ion-assisted deposition, and chemical vapor deposition (CVD). He developed an ion beam deposition process for very low loss, high reflectivity TiO2/SiO2 mirrors. He has expertise in the use of FilmStar Software for multilayer thin film design.

He has purchased and set-up procedures for use and operation of many spectrophotometers: UV-VIS, FTIR, Ellipsometer, and Colorimeter. He also set up irradiance spectrophotometers from Ocean Optics.

He developed photochromic dyes, materials and abrasion resistant, hard organic coatings for polycarbonate ophthalmic lenses. He also developed thin film, vacuum deposited Anti-Reflective coatings for clear and Mirror coatings for sunwear lenses. Technical areas include lens optics, polarizing films and laminates, and L*,a*,b* and CIE color coordinate systems for color of lenses, films, coatings and sunwear. He developed test procedures for internal standards, national and international test standards including ANSI and ASTM standards for prescription and non-prescription eyewear.

Teltech, 1993Vision-Ease Lens, 1993-1994: Developed strategy for photochromic polycarbonate lens product.