Intellex Acquires Expert by Big Village

We're thrilled to announce that Intellex has acquired Expert by Big Village, effective March 22, 2024. This strategic move enhances our capabilities and strengthens our commitment to delivering exceptional solutions to our customers.

Stay tuned for more updates on how this acquisition will benefit our clients and experts.

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Expert Details

Semiconductor Post Etch Residue Cleaning, Post CMP Cleaning and CMP Slurries, Photoinitiator Process

ID: 723753 Arizona, USA

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Expert managed the initial stages for the ITX photoinitiator process as an applied organic chemist. He designed research parameters and the design of experiments to define process parameters and process economics. This product had annual sales of $3+ MM. Interacted with EKC Technology (now DuPont EKC Technology) as liaison chemist. Projects included developing analytical techniques for EKC265, new variations of solvent systems for hydroxylamine-based chemistries. He developed optical cleaners to meet important process and environmental constraints.

Expert also developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr. He developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. He directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound and a subsequent two-step process for a generic beta-blocker pharmaceutical drug. Expert developed a process for a specialty acry¬lamide monomer with 90+% yields and low residual sulfate levels.

He also directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. He established the basic catalyst composition and developed specific reaction parameters and analytical techniques. He developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments.

Expert initiated the Chemical Mechanical Polishing (CMP) program for oxides and tungsten and copper metal films for EKC Technology. He was responsible for designing chemistries, setting up laboratory equipment, and establishing contact with an slurry manufacturer. Fifteen basic patents for the CMP program have been issued.

He initiated the CMP program for oxides and metal films. Responsible for designing chemistries, setting up laboratory equipment, and establishing contact with an slurry manufacturer. Fifteen basic patents for the CMP program have been issued. The Chemical Mechanical polishing (CMP) program were introduced, compared to only three new products in the previous two years. He managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP cleaning products. Interacted with customers concerning process problems related to wet chemical and CMP/post CMP processes for semiconductor wafer processing. Under his direction the number of patent applications was increased by a factor of four and more than 120 publications and conference papers (30-fold increase) had been published.

During the first 36 month period, twelve new products, including new fluoride, semi-aqueous chemistries and the CMP program were introduced, compared to only three new products in the previous two years for the semiconductor industry. Potential sales are $17+ MM. Managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP cleaning products. Expert developed a patented new post-clean treatment solvent systems, with sales projected to be $5+ MM.

Expert also developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr and developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. Directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound and a subsequent two-step process for a generic beta-blocker pharmaceutical drug. Developed a process for a specialty acrylamide monomer with 90+% yields and low residual sulfate levels.

Expert modified a heteroaromatic cyclization process for a insectecide to increase yields 7-8%. The raw material costs were reduced 50% with annual savings of $1.2-1.5MM/yr. Modified a carbon-less dye process for existing plant equipment while implementing over $50M savings for the campaign.

He also directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. Established the basic catalyst composition and developed specific reaction parameters and analytical techniques. Developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments.

He has had 45+ years of organic chemistry experience.

Expert is involved in the design of new cleaning chemistries and new cleaning technologies for the semiconductor industry. Also involved in Chemical Mechanical Polishing (CMP) slurry design. During the first 36 month period as R&D director at EKC Technology, twelve new products, including new fluoride, semi-aqueous chemistries and the CMP program were introduced, compared to only three new products in the previous two years for the semiconductor wafer processing industry. Potential sales are $17+ MM. Managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP products. He interacted with customers concerning process problems related to wet chemical and CMP/post CMP processes.

He was also a major participant in the successful commercialization of EKC265 which currently has $80+ MM in sales. Developed a patented new post-clean treatment solvent system, with sales projected to be $5+ MM.

He has worked with clients to evaluate process problems for a post etch residue cleaner products for semiconductor processes.He has working with other clients to develop viable abrasive slurry products for the CMP market.He is working with another client to develop a completely new method of removing particles from wafers with very Expert quantities of chemicals.

Education

Year Degree Subject Institution
Year: 1971 Degree: Ph. D. Subject: Organic chemistry Institution: University of Arizona
Year: 1965 Degree: M.S. Subject: Organic Chemistry Institution: Texas Tech University
Year: 1961 Degree: B.S. Subject: Chemistry Institution: Norwich University

Work History

Years Employer Title Department
Years: 2004 to 2007 Employer: (Undisclosed) Title: CTO Department: R&D
Responsibilities:
He is the Technology Consultant. He is involved in developing new chemistry for post-CMP cleaning, CMP chemistry and post-etch residue removal.
Years Employer Title Department
Years: 1992 to 2004 Employer: DuPont/EKC Technologies Title: R&D Technical Director and CMP Technical Director Department: R&D
Responsibilities:
He held the positions of CMP Technical Director and also was the R&D Technical Director for the chemical remover (BEOL) line of business at DuPont/EKC Technology, for a total of 10 years out of a 30 year chemical career. He was involved in developing new chemistries for post-CMP cleaning, CMP chemistries and post-etch residue removal. He holds more than 30 U.S. and foreign patents and currently has ten submitted U.S. patent applications and has authored or co-authored over 120 articles and presentations including BEOL, post clean treatment, post CMP and CMP processes.
Years Employer Title Department
Years: 1990 to 1995 Employer: First Chemical Corp Title: Senior Research Chemist Department: R&D
Responsibilities:
He managed the technical development for the ITX photoinitiator process. Designed research parameters and the design of experiments to define the process and its economics. This product had anticipated annual sales of $3+ MM.
He interacted with EKC Technology as liaison chemist. Project development included developing analytical techniques for EKC265, new solvent variations for hydroxylamine-based chemistries. Developed optical cleaners meeting important process and environmental constraints. Recipient of the first “Technical Catalyst Award” in 1994.
Years Employer Title Department
Years: 1985 to 1990 Employer: Wesley Industry Title: Research Director Department: R&D
Responsibilities:
He managed the corporate laboratory and two plant laboratories and coordinated Wesley projects at three off-site research groups. The personnel varied from four to eleven people. Developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr. Developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. Directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound. Developed a process for a specialty acrylamide monomer with 90+% yields and low residual sulfate levels.
Years Employer Title Department
Years: 1980 to 1985 Employer: Ciba-Geigy Corp Title: Project Leader Department: Process Development
Responsibilities:
He eliminated a special catalyst for production of Diazion, an agrochemical insecticide. Production rates were increased by 10% with an annual catalyst savings of $0.3 -0.5 MM/yr. at production rates of 10-16 MM pounds/yr. Modified a heteroaromatic cyclization process to increase yields 7-8%. The raw material was reduced 50% with annual savings of $1.2-1.5MM/yr. He modified a carbon-less dye process for existing plant equipment while implementing over $50M savings for the campaign.
Years Employer Title Department
Years: 1974 to 1980 Employer: Ashland Chemical Co Title: Sr. Research Chemist Department: R&D
Responsibilities:
He directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. Established the basic catalyst composition and developed specific reaction parameters and analytical techniques. Developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments. Supervised a 3-4-member group of chemists.
Years Employer Title Department
Years: 1973 to 1974 Employer: Celanese Chemical Co. Title: Research Chemist Department: R&D
Responsibilities:
He conducted exploratory research for new vapor phase heterogeneous processes for the oxidation of olefins. Also worked on the liquid phase homogenous and heterogeneous oxidation of olefins and aldehydes.

Government Experience

Years Agency Role Description
Years: 1972 to 1975 Agency: U.S. Army Role: Research Chemist Description: Developed methods to destroy a variety of chemical weapons.

International Experience

Years Country / Region Summary
Years: 1994 to 2004 Country / Region: Asia Summary: Consulted with customers about wafer cleaning problems and CMP polishing problems.
Years: 1994 to 2004 Country / Region: Europe Summary: Consulted with customers about wafer cleaning problems and CMP polishing problems.

Career Accomplishments

Associations / Societies
American Chemical Society, Electrochemical Society, Royal Chemical Society. Sigma Xi
Awards / Recognition
Recipient of the first “Technical Catalyst Award” in 1994 from First Chemical Corp.
Publications and Patents Summary
He holds more than 30 U.S. and foreign patents and currently has ten submitted U.S. patent applications and he has authored or co-authored over 120 articles and presentations including BEOL, post clean treatment, post CMP and CMP processes.
He is also co-author of two chapters in the 2nd edition of "Handbook of Silicon Wafer Cleaning Technology" edited by Karen Reinhardt and Werner Kern

Additional Experience

Training / Seminars
I have taught a number of course on back end of line cleaning (post etch residues) and post CMP cleaning in the semiconductor industry.
Vendor Selection
Helping clients find suppliers for CMP abrasives and chemicals and also chemicals for wafer cleaning applications.
Marketing Experience
Follow the technical trends for wafer cleaning and polishing processes.

Fields of Expertise

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