Expert Details
Semiconductor Post Etch Residue Cleaning, Post CMP Cleaning and CMP Slurries, Photoinitiator Process
ID: 723753
Arizona, USA
Expert also developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr. He developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. He directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound and a subsequent two-step process for a generic beta-blocker pharmaceutical drug. Expert developed a process for a specialty acry¬lamide monomer with 90+% yields and low residual sulfate levels.
He also directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. He established the basic catalyst composition and developed specific reaction parameters and analytical techniques. He developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments.
Expert initiated the Chemical Mechanical Polishing (CMP) program for oxides and tungsten and copper metal films for EKC Technology. He was responsible for designing chemistries, setting up laboratory equipment, and establishing contact with an slurry manufacturer. Fifteen basic patents for the CMP program have been issued.
He initiated the CMP program for oxides and metal films. Responsible for designing chemistries, setting up laboratory equipment, and establishing contact with an slurry manufacturer. Fifteen basic patents for the CMP program have been issued. The Chemical Mechanical polishing (CMP) program were introduced, compared to only three new products in the previous two years. He managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP cleaning products. Interacted with customers concerning process problems related to wet chemical and CMP/post CMP processes for semiconductor wafer processing. Under his direction the number of patent applications was increased by a factor of four and more than 120 publications and conference papers (30-fold increase) had been published.
During the first 36 month period, twelve new products, including new fluoride, semi-aqueous chemistries and the CMP program were introduced, compared to only three new products in the previous two years for the semiconductor industry. Potential sales are $17+ MM. Managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP cleaning products. Expert developed a patented new post-clean treatment solvent systems, with sales projected to be $5+ MM.
Expert also developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr and developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. Directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound and a subsequent two-step process for a generic beta-blocker pharmaceutical drug. Developed a process for a specialty acrylamide monomer with 90+% yields and low residual sulfate levels.
Expert modified a heteroaromatic cyclization process for a insectecide to increase yields 7-8%. The raw material costs were reduced 50% with annual savings of $1.2-1.5MM/yr. Modified a carbon-less dye process for existing plant equipment while implementing over $50M savings for the campaign.
He also directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. Established the basic catalyst composition and developed specific reaction parameters and analytical techniques. Developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments.
He has had 45+ years of organic chemistry experience.
Expert is involved in the design of new cleaning chemistries and new cleaning technologies for the semiconductor industry. Also involved in Chemical Mechanical Polishing (CMP) slurry design. During the first 36 month period as R&D director at EKC Technology, twelve new products, including new fluoride, semi-aqueous chemistries and the CMP program were introduced, compared to only three new products in the previous two years for the semiconductor wafer processing industry. Potential sales are $17+ MM. Managed the R&D CMP program and designed and developed five of the CMP (W, Cu, Ir, IrO2 and Pt) and two post CMP products. He interacted with customers concerning process problems related to wet chemical and CMP/post CMP processes.
He was also a major participant in the successful commercialization of EKC265 which currently has $80+ MM in sales. Developed a patented new post-clean treatment solvent system, with sales projected to be $5+ MM.
He has worked with clients to evaluate process problems for a post etch residue cleaner products for semiconductor processes.He has working with other clients to develop viable abrasive slurry products for the CMP market.He is working with another client to develop a completely new method of removing particles from wafers with very Expert quantities of chemicals.
Education
Year | Degree | Subject | Institution |
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Year: 1971 | Degree: Ph. D. | Subject: Organic chemistry | Institution: University of Arizona |
Year: 1965 | Degree: M.S. | Subject: Organic Chemistry | Institution: Texas Tech University |
Year: 1961 | Degree: B.S. | Subject: Chemistry | Institution: Norwich University |
Work History
Years | Employer | Title | Department |
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Years: 2004 to 2007 | Employer: (Undisclosed) | Title: CTO | Department: R&D |
Responsibilities:He is the Technology Consultant. He is involved in developing new chemistry for post-CMP cleaning, CMP chemistry and post-etch residue removal. |
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Years | Employer | Title | Department |
Years: 1992 to 2004 | Employer: DuPont/EKC Technologies | Title: R&D Technical Director and CMP Technical Director | Department: R&D |
Responsibilities:He held the positions of CMP Technical Director and also was the R&D Technical Director for the chemical remover (BEOL) line of business at DuPont/EKC Technology, for a total of 10 years out of a 30 year chemical career. He was involved in developing new chemistries for post-CMP cleaning, CMP chemistries and post-etch residue removal. He holds more than 30 U.S. and foreign patents and currently has ten submitted U.S. patent applications and has authored or co-authored over 120 articles and presentations including BEOL, post clean treatment, post CMP and CMP processes. |
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Years | Employer | Title | Department |
Years: 1990 to 1995 | Employer: First Chemical Corp | Title: Senior Research Chemist | Department: R&D |
Responsibilities:He managed the technical development for the ITX photoinitiator process. Designed research parameters and the design of experiments to define the process and its economics. This product had anticipated annual sales of $3+ MM.He interacted with EKC Technology as liaison chemist. Project development included developing analytical techniques for EKC265, new solvent variations for hydroxylamine-based chemistries. Developed optical cleaners meeting important process and environmental constraints. Recipient of the first “Technical Catalyst Award” in 1994. |
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Years | Employer | Title | Department |
Years: 1985 to 1990 | Employer: Wesley Industry | Title: Research Director | Department: R&D |
Responsibilities:He managed the corporate laboratory and two plant laboratories and coordinated Wesley projects at three off-site research groups. The personnel varied from four to eleven people. Developed oxidation processes for two specialty aldehydes with projected sales of over $5 MM/yr. Developed processes for three phenolic antioxidants and two ultraviolet benzotriazole stabilizers for the plastics industry with anticipated $20 MM per year sales. Directed the development of a 2.5 MM pound per year three-step process for a hydroxylated aromatic compound. Developed a process for a specialty acrylamide monomer with 90+% yields and low residual sulfate levels. |
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Years | Employer | Title | Department |
Years: 1980 to 1985 | Employer: Ciba-Geigy Corp | Title: Project Leader | Department: Process Development |
Responsibilities:He eliminated a special catalyst for production of Diazion, an agrochemical insecticide. Production rates were increased by 10% with an annual catalyst savings of $0.3 -0.5 MM/yr. at production rates of 10-16 MM pounds/yr. Modified a heteroaromatic cyclization process to increase yields 7-8%. The raw material was reduced 50% with annual savings of $1.2-1.5MM/yr. He modified a carbon-less dye process for existing plant equipment while implementing over $50M savings for the campaign. |
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Years | Employer | Title | Department |
Years: 1974 to 1980 | Employer: Ashland Chemical Co | Title: Sr. Research Chemist | Department: R&D |
Responsibilities:He directed the development of a vapor phase heterogeneous oxidative dehydrogenation process. Established the basic catalyst composition and developed specific reaction parameters and analytical techniques. Developed an economical process for the liquid-phase reductive methylation of long chain amines and hydrazines. Projects were carried from the bench scale to the pilot plant level. Process generated $2-3 MM/yr in royalty payments. Supervised a 3-4-member group of chemists. |
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Years | Employer | Title | Department |
Years: 1973 to 1974 | Employer: Celanese Chemical Co. | Title: Research Chemist | Department: R&D |
Responsibilities:He conducted exploratory research for new vapor phase heterogeneous processes for the oxidation of olefins. Also worked on the liquid phase homogenous and heterogeneous oxidation of olefins and aldehydes. |
Government Experience
Years | Agency | Role | Description |
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Years: 1972 to 1975 | Agency: U.S. Army | Role: Research Chemist | Description: Developed methods to destroy a variety of chemical weapons. |
International Experience
Years | Country / Region | Summary |
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Years: 1994 to 2004 | Country / Region: Asia | Summary: Consulted with customers about wafer cleaning problems and CMP polishing problems. |
Years: 1994 to 2004 | Country / Region: Europe | Summary: Consulted with customers about wafer cleaning problems and CMP polishing problems. |
Career Accomplishments
Associations / Societies |
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American Chemical Society, Electrochemical Society, Royal Chemical Society. Sigma Xi |
Awards / Recognition |
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Recipient of the first “Technical Catalyst Award” in 1994 from First Chemical Corp. |
Publications and Patents Summary |
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He holds more than 30 U.S. and foreign patents and currently has ten submitted U.S. patent applications and he has authored or co-authored over 120 articles and presentations including BEOL, post clean treatment, post CMP and CMP processes. He is also co-author of two chapters in the 2nd edition of "Handbook of Silicon Wafer Cleaning Technology" edited by Karen Reinhardt and Werner Kern |
Additional Experience
Training / Seminars |
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I have taught a number of course on back end of line cleaning (post etch residues) and post CMP cleaning in the semiconductor industry. |
Vendor Selection |
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Helping clients find suppliers for CMP abrasives and chemicals and also chemicals for wafer cleaning applications. |
Marketing Experience |
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Follow the technical trends for wafer cleaning and polishing processes. |
Fields of Expertise
applied organic chemistry, chemical mechanical polishing, post chemical-mechanical planarization cleaning, new product development, organic chemistry, semiconductor wafer processing, silicon wafer cleaning, commercialization, semiconductor industry chemical, synthetic organic chemistry, inorganic base, dimethyl sulfoxide, rapid product development, product development cycle time, semiconductor material processing, complementary metal-oxide semiconductor device, silicon wafer, new product development management, semiconductor wafer, qualitative organic chemistry, inorganic chemistry, inorganic acid, chemical analysis, applied inorganic chemistry