Expert Details
Organic Chemistry, Polymer Chemistry, Photoresists, Photoresist strippers, Sustainability
ID: 732116
Pennsylvania, USA
A significant portion of my career has been spent in organic chemistry and its application. He spent over 10 years in bench top synthesis of organic compounds as well as organic monomers and polymers. Expert also published several peer reviewed papers in the area of Organic synthesis.
Product Life Cycle Management, Cross-functional Leadership, Collaboration, Technology Strategy & Integration Competitive Analysis, IP Management, Product Development & Deployment
Education
Year | Degree | Subject | Institution |
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Year: 1989 | Degree: PhD | Subject: Organic Chemistry | Institution: Mississippi State University |
Year: 1982 | Degree: BS | Subject: Chemistry | Institution: Southern University |
Year: 2007 | Degree: Certificate | Subject: Executive cerificate in Management and Leadership | Institution: MIT - Sloan School of Management |
Work History
Years | Employer | Title | Department |
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Years: 2004 to 2015 | Employer: Air Products ans Chemicals, Inc. | Title: Technology Manager | Department: Electronic Technology |
Responsibilities:Managed research and development for stripper development. Created and deployed products that increased sales by roughly 10% in 4 years. |
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Years | Employer | Title | Department |
Years: 1999 to 2004 | Employer: Ashland Chemical Company | Title: Senior Staff Development Chemist | Department: Electronics Chemicals Division |
Responsibilities:Developed strippers for pre and post-plasma etch process in semiconductor processing. Worked with customers to develop and optimize specific chemistries that met process and environmental requirements. Developed working knowledge of the mechanism of specific chemistries; served as project and program manager. |
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Years | Employer | Title | Department |
Years: 1997 to 1998 | Employer: Eaton Corporation | Title: Senior Process Engineer | Department: Fusion Systems Division |
Responsibilities:Developed a process for lithographic resist processing for plasma etch and ion implant curing of polymers. |
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Years | Employer | Title | Department |
Years: 1996 to 1997 | Employer: Microlithography Chemical Corporation | Title: Project Manager | Department: |
Responsibilities:Program manager responsible for the Research and Development of 193 nm resist program and report directly to the Director of Research. Additional responsibilities includes hands-on synthetic work in the preparation of Organic and Polymeric materials. |
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Years | Employer | Title | Department |
Years: 1991 to 1996 | Employer: Polaroid Corporation | Title: Scientist | Department: Film Imaging Division |
Responsibilities:Created polymers used in 248 nm resists. Effects of temperature on dye-polymer interactions and latitude on films. Carbon black interactions with silver ions. |
Career Accomplishments
Associations / Societies |
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Technology and Processes of Plasma Etching – University Consortium for Continuing Education Water-Soluble/water-borne polymers – University of Southern Mississippi/Southern Society for Coatings Technology Product and Process Optimization (TAGUCHI) – Polaroid. Industrial Rheology – The Center for Professional Advancement Advances in Emulsion Polymerization and latex Technology – Lehigh University (Emulsion Polymer Institute) Imaging Science – Rochester Institute of Technology. MEMBER, American Chemical Society |
Publications and Patents Summary |
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Coauthored over 40 technical papers, seminars, etc., on various aspects of polymer chemistry, organic chemistry, semiconductor processing and material science. Inventor/co-inventor of over 30 US and international issued patents |