Expert Details
IC Substrate Manufacturing, Chemical Vapor Deposition, Phenomenological Thermodynamic Modeling
ID: 727799
California, USA
He provided consulting expertise to a company building MEMS-type devices consisting of a sequential build process which suffered from a corrosion issue. Provided a detailed review of potential sources of corrosion, and proposed a corrective action plan to address the issues.
Education
Year | Degree | Subject | Institution |
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Year: 2004 | Degree: PhD | Subject: Chemical Engineering | Institution: University of Florida |
Year: 1997 | Degree: Bachelor's | Subject: Chemical Engineering | Institution: Georgia Institute of Technology |
Work History
Years | Employer | Title | Department |
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Years: 2016 to Present | Employer: Undisclosed | Title: Principal Microelectronic Packaging Engineer | Department: |
Responsibilities:Microelectronic packaging engineer developing breakthrough data-center switch technology to increase bandwidth and reduce cost. |
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Years | Employer | Title | Department |
Years: 2008 to Present | Employer: Undisclosed | Title: Director, Engineering | Department: |
Responsibilities:Director of Engineering leading substrate and advanced packaging teams |
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Years | Employer | Title | Department |
Years: 2004 to 2008 | Employer: Intel Corporation | Title: Senior Packaging Engineer | Department: Assembly Test Technology Development |
Responsibilities:Packaging engineer focused on substrate module (surface finish, Cu plating, core material and buildup dielectric material selection, halogen-free conversion) |
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Years | Employer | Title | Department |
Years: 1999 to 2004 | Employer: University of Florida | Title: Graduate student | Department: Department of Chemical Engineering |
Responsibilities:MOCVD of thin film diffusion barriers (WNxCy), epitaxy buffer layers (BP), and high brightness electron sources (LaB6). Thermodynamic analysis of a 5-component W-N-H-C-Cl system. |
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Years | Employer | Title | Department |
Years: 1997 to 1999 | Employer: Fluor Daniel, Inc | Title: Associate Process Engineer II | Department: |
Responsibilities:Chemical engineer supporting design and fabrication of manufacturing plants, including DuPont acrylic resin, DuPont automotive paint, and GE polycarbonate facility expansions. |
International Experience
Years | Country / Region | Summary |
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Years: 2008 to 1915 | Country / Region: Asia-Pacific | Summary: He defines the substrate technology roadmap for a Fortune 500 company, and is driving substrate manufacturing technology upgrades and implementation to production at a number of substrate manufacturing sites in Asia. He also drives assembly material selection and process improvements at a number of large asubcontractor sites in Asia. |
Years: 2004 to 2008 | Country / Region: Japan | Summary: Working with major FCBGA/FCPGA/FCLGA substrate suppliers, he drove implementation of new ENEPIG surface finish onto substrates used in HVM by a major worldwide semiconductor producer. He also drove technology development for copper plating (to improve thickness uniformity), led halogen-free substrate materials selection and implementation, and led a warpage improvement effort for said major worldwide semiconductor producer. |
Career Accomplishments
Associations / Societies |
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-iNEMI -iMAPS -AICHE |
Professional Appointments |
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-Former co-chair of iNEMI surface finish consortium -Session chair for iMAPs "Think Thin" workshop |
Awards / Recognition |
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-Invited guest lecturer to ASU's Introduction to Microelectronic Packaging Course -Invited speaker at Intel/Halogen Free Symposium |
Publications and Patents Summary |
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He has 27 patents issued by the USPTO, and over 10 publications. |
Additional Experience
Training / Seminars |
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Regularly teach a half-day class on IC substrate manufacturing at Qualcomm. Have also taught similar class at Arizona State University as a guest lecturer. |
Vendor Selection |
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Expert has significant experience in choosing, vetting, and qualifying suppliers for substrate manufacturing, MLCC capacitor manufacturing, core/prepreg manufacturing, solder resist manufacturing, and assembly manufacturing. |
Marketing Experience |
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Expert lead development of Qualcomm's substrate roadmap, which is the model for FCCSP development in the industry. He also collaborated on Qualcomm's overall packaging roadmap, which is a model for packaging in the mobile space. He has significant industry network, and remain apprised of key developments on regular basis. |
Other Relevant Experience |
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Expert can provide consulting on substrate manufacturing yield improvements, warpage improvements, roadmapping, and assembly technology troubleshooting. |
Language Skills
Language | Proficiency |
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French | He can speak, read and write French at an intermediate level, having studied for 4 years in high school and 1 year at University level. |
Portuguese | He can speak, read and write Brazilian Portuguese at an intermediate level, having traveled substantially to Brazil from 2002 to present day. |
Fields of Expertise
copper metallizing, interconnect substrate, metal organic chemical vapor deposition, printed circuit board substrate, surface finishing process, atomic layer deposition, film surface treatment, thin-film electromigration, printed circuit board material, chemical vapor deposition reactor, surface characterization, electronic packaging technology, depaneling, plastic substrate, chip-to-package interconnection, chemical vapor deposition precursor material, printed circuit board drilling, four point probe, hybrid microelectronic device, dielectric coating, base metal (plating/cladding), warpage, low-pressure chemical vapor deposition, copper etching, interconnection technology process development, adhesion promoter, via, electronic material, vacuum metallizing, metal to plastic adhesion, semiconductor assembly engineering, surface finish property, printed circuit board manufacturing, printed circuit board laminate, printed circuit board assembly process, printed circuit board, electrochemical metal etching, thin-film deposition, electroplating, finishing material, finishing, integrated circuit assembly, substrate, thin film, thin-film circuit, thick film, semiconductor metallizing, plating process, metallizing, metal finishing process, chemical vapor deposition