Expert Details

Advanced Semiconductor Lithography

ID: 723210 California, USA

Expert has worked in electron beam lithography research and application since graduate school. Specifically he developed new pattern generation techniques for improved throughput and accuracy. He also developed a new generation of electron beam mask writer. His work on the multi-beam electron beam direct-write system involved all aspects of system design. Direct-write electron beam is still a promising alternative expensive masked lithography.

At Nikon, Expert developed new optical lithography concepts and installed the system in major US laboratories. He also developed many subsystem concepts for alignment and lens testing using precision mechanics and machine vision.

Semiconductor lithography has evolved from contact mask lithography to the use of short wavelength light in projection or particle beams. Expert has contributed to research and application in each of these methods. His hands-on experience is with ion beams, electron beams, x-rays, and optics. Semiconductor lithography is the key to denser integrated circuits. More recent work has helped define the ultimate limits.

In 1973, Expert developed an x-ray lithography system just one year after its first publication. His work resulted in a system for micron lithography. He worked on mask technology, x-ray sources and alignment. Later he worked to transfer and perfect the x-ray lithography of a major industrial lab.

Array

Expert worked on-site to build and check-out an accelerated test system for polymer coatings.

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Education

Year	Degree	Subject	Institution
Year: 1970	Degree: PhD	Subject: Electrical Engineering	Institution: University of Southern California
Year: 1966	Degree: MS	Subject: Electrical Engineering	Institution: University of Southern California
Year: 1964	Degree: BS	Subject: Engineering	Institution: California Institute of Technology

Work History

Years	Employer	Title	Department
Years: 2001 to Present	Employer: Undisclosed	Title: Consultant/owner	Department:
Responsibilities: Expert has consulted in technical, marketing, and intellectual property issues regarding advanced semiconductor lithography-optical, x-ray, and electron beam. He also consults in precision mechanisms and materials especially as applied to lithography.
Years	Employer	Title	Department
Years: 1998 to 2000	Employer: Ion Diagnostics Inc	Title: Senior Scientist and Systems Manager	Department:
Responsibilities: Expert solved system design issues and contributed to marketing and IP strategies for a multi-beam multi-column electron beam lithography system for the Next Generation Lithography requirements of the International Technology Roadmap
Years	Employer	Title	Department
Years: 1990 to 1998	Employer: Nikon Research Corp of America	Title: R and D Project Manager	Department:
Responsibilities: Expert contributed as senior staff and program manager on advanced semiconductor lithography. His last project was the joint IBM-Nikon electron beam projection system (similar to SCALPEL). Other projects included system design, electronics, and software for an optics calibration system, machine vision for alignment and inspection, software development for picture editing, and system design for flat panel display lithography.
Years	Employer	Title	Department
Years: 1986 to 2000	Employer: Nikon Precision Inc	Title: Senior Manager	Department:
Responsibilities: Expert was project manager for four beta test excimer laser steppers including all aspects of specification negotiation, delivery, installation, and joint evaluation. In addition he managed the demonstration and research laboratory which included designing a new 5000 square foot facility, supervision of six engineers and their projects in stepper characterization, resist evaluation, and system software
Years	Employer	Title	Department
Years: 1982 to 1986	Employer: Varian Associates	Title: Engineering Manager	Department: Lithography Division
Responsibilities: At Varian Expert directed the development of an X-ray lithography system with responsibility for transferring licensed technology, developing government contracts, helping create a business plan, staffing, and supervising the electronic, software, and mechanical engineering effort. He also served as acting Manager of Software Development and Support for Varian's E-beam mask making product, a position involving supervision of eight software engineers and strong customer interaction. Initially Expert managed electronics development for the Varian VLS-80 e-beam mask making system which featured a faster 80 MHz data rate, semiconductor memory, and improved overlay.
Years	Employer	Title	Department
Years: 1979 to 1982	Employer: Rockwell International	Title: Senior MTS	Department: Microelectronics R&D Center
Responsibilities: For Rockwell Expert established of a computerized lab for characterization of submicron CMOS-SOS and bulk IC devices and for developing programs in lithography and military radiation effects, including the VHSIC military program. Advanced lithography systems included electron beam and X-ray.
Years	Employer	Title	Department
Years: 1969 to 1979	Employer: Hughes Aircraft	Title: MTS	Department: Hughes Research Laboratories
Responsibilities: Expert was Program Manager and Principal Investigator for precision mask alignment contract with the US. Navy and responsible for pattern generator and applications for focused ion beam lithography. He carried out early experiments on energy losses and materials for masked ion beam lithography and co-originated a pioneer program in x-ray lithography and made major contributions to source optimization and design, to masks, to mask alignment, to resist evaluation, to process technology for IC fabrication, and to radiation effects on MOS devices. In previous work at Hughes Expert developed high power hybrid microcircuits involving circuit design, exotic materials, and analysis.

International Experience

Years	Country / Region	Summary
Years: 1993 to 1993	Country / Region: Japan	Summary: Expert implemented tests of machine vision to perform alignment of LCD flat panel lithography systems.
Years: 1995 to 1995	Country / Region: Japan	Summary: Expert installed and proved a lens testing system in an optics factory.

Career Accomplishments

Associations / Societies
SPIE, IEEE

Professional Appointments
Treasurer IEEE Lithography Workshop

Publications and Patents Summary
He has 14 publications and 11 patents in the field of advanced lithography and material properties

Additional Experience

Expert Witness Experience
Expert provided depositions to an intellectual property suit involving precision mechanism for semiconductor lithography and in a second case involving characterization of materials with electron beams and lasers.

Vendor Selection
He has extensive experience in evaluating and selecting materials and vendors for ceramic structures, ceramic-metal composites, insulations, linear motors, and fiber optic components.

Marketing Experience
Expert contibuted to the marketing of advanced lithography systems to semiconductor manufacturing.

Other Relevant Experience
Considerable experience in prior art evaluation for lithography and related semiconductor equipment.

Fields of Expertise

electron-beam lithography, semiconductor wafer mask aligner, optical microlithography, semiconductor lithography, X-ray lithography, optical lens testing, semiconductor wafer inspection, ion-beam lithography, photoresist, semiconductor mask

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Expert Details

Advanced Semiconductor Lithography

Education

Work History

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International Experience

Career Accomplishments

Additional Experience

Fields of Expertise