Expert Details
Thin Film Science and Technology
ID: 107921
Georgia, USA
LOW TEMPERATURE PLASMA; PLASMA ENHANCED CVD; SPUTTER ETCHING. Expert's work in films and coatings has primarily utilized plasmas or glow discharges to etch, deposit, or modify films or coatings. These efforts have concentrated on understanding how plasma parameters (power, pressure, frequency) control film etch or deposition rates, film properties (especially electrical, chemical, and physical), structure, etch profiles, and selectivity. The use of high density plasma sources for film processing are also being explored.
MICROELECTRONIC THIN FILMS APPLICATIONS; SEMICONDUCTOR PROCESSING. Expert's industrial experience were in the semiconductor industry where he was responsible for research, development, and production aspects of integrated circuit fabrication. He worked on characterization of semiconductor, metal, and dielectric surfaces and interfaces by various electrical and analytical techniques. Other methods he used include oxidation, diffusion, photolithography, metallization, ion implantation, radiation damage, passivation of surfaces, plasma processes, and chemical vapor deposition.
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Education
| Year | Degree | Subject | Institution |
|---|---|---|---|
| Year: 1973 | Degree: PhD | Subject: Physical Chemistry | Institution: Lehigh University |
| Year: 1970 | Degree: MS | Subject: Physical Chemistry | Institution: Lehigh University |
| Year: 1968 | Degree: BS | Subject: Chemistry | Institution: Albright University |
Work History
| Years | Employer | Title | Department |
|---|---|---|---|
| Years: 1997 to Present | Employer: Undisclosed | Title: Professor | Department: Chemical Engineering |
Responsibilities:Available upon request. |
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| Years | Employer | Title | Department |
| Years: 1991 to 1996 | Employer: Lehigh University | Title: Chair | Department: Chemical Engineering |
Responsibilities:Available upon request. |
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| Years | Employer | Title | Department |
| Years: 1978 to 1984 | Employer: Lawrence Berkeley Laboratory | Title: Principal Investigator | Department: Materials & Molecular Research Division |
Responsibilities:Available upon request. |
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| Years | Employer | Title | Department |
| Years: 1977 to 1991 | Employer: University of California - Berkeley | Title: Professor | Department: Chemical Engineering |
Responsibilities:Available upon request. |
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| Years | Employer | Title | Department |
| Years: 1982 to 1987 | Employer: University of California - Berkeley | Title: Assistant Dean of College of Chemistry | Department: College of Chemistry |
Responsibilities:Available upon request. |
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| Years | Employer | Title | Department |
| Years: 1973 to 1977 | Employer: Fairchild Camera & Instrument Corporation | Title: Research | Department: Process Development |
Responsibilities:Available upon request. |
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Career Accomplishments
| Associations / Societies |
|---|
| Expert offers short courses for the Electrochemical Society, and the University of California Extension on plasma-enhanced etching and deposition. |
| Professional Appointments |
|---|
| Expert was an Associate Editor for the journal Chemistry of Materials from. He is a past Chairman of the San Francisco section of the Electrochemical Society, and was President of the Electrochemical Society, Inc. |
Fields of Expertise
chemical vapor deposition, etching, integrated circuit, ion etching, low-temperature plasma, microelectronics thin-film application, plasma spraying, plasma-enhanced chemical vapor deposition, plastic film, semiconductor material processing, semiconductor metallizing, semiconductor passivation, thin film, thin-film application, thin-film electrical property, thin-film integrated circuit, thin-film technology, thin film science, passivation, semiconductor industry chemical, polymer thin film, plasma deposition system, plasma damage, integrated-circuit manufacturing, photoresist ashing, photoresist stripping, low-pressure chemical vapor deposition, metal surface, semiconductor etching, silicon processing, semiconductor wafer processing, semiconductor wafer etching, plasma etching technology process development, semiconductor technology, semiconductor integrated processing, thin-film processing, microfabrication plasma etching, semiconductor wafer cleaning, semiconductor device manufacturing, energy conversion, reactive ion etching, ion implantation, chemical etching, plasma cleaning, plasma surface treatment, plasma polymerization, X-ray photoelectron spectroscopy, microelectronics science, thin-film optical property, thin-film analysis, thin-film property, gas plasma, X-ray diffraction analysis, vapor deposition, thin-film circuit, semiconductor thermal oxidation, tantalum, surface analysis, sputter deposition, semiconductor material, plasma-aided manufacturing, plasma etching, photoresist, metal passivation, non-crystalline structure, microlithography, material analysis, electron microscopy, solid electric property, solid-dielectric property, dielectric material, dielectric film, Auger electron spectroscopy