Request Expert

He has over 25 years experience in the field of chemical vapor deposition. He has designed and built CVD coating systems up to 1.5m diameter & 2m high. He has a particular experience in high temperature (1200 - 2200 degC) CVD processes and design of equipment for these processes.
Typical coatings include, prolytic graphite, pyrolytic carbon, boron nitride, silicon nitride, aluminium nitride, silicon carbibe, boron carbide, tungsten, tunsten carbide, tantalum, tantalum carbide, niobium, iridium, rhenium.

As a practioner or chemical vapor deposition and organo-metallic chemical vapor deposition for over 25 years, he has a wide experience in the selection of precusor materials for chemical vapor deposition: Organometallic and inorganic chlorides, fluorides etc.

He has extensive experience of designing and building chemical vapor deposition reactors from laboratory size up to very large industrial machines. He has designed and developed new types of reactor for CVD, CVI, OMCVD, HTCVD (1200degC+).

He has over 25 years experience in the field of chemical vapor deposition. He has designed and built CVI systems up to 1.5m diameter & 2m high.
He has extensive experience in the production of ceramic matrix composites (CMCs) from 2D, 2.5D & 3D Carbon & Nicalon fabrics and matix/interlayer materials C, SiC, BN, SidopedBN.
He has also recently done some interesting work on the CVI of tungsten to produce a W/W MMC.


He has extensive first hand experience of coating processes including CVD, CVI, PACVD, OMCVD PVD, EBPVD.

He has extensive experience of depositing both pyrolytic carbon and pyrolytic graphite coatings.
Pyrolytic graphite is a 100% dense very strong material with a very anisotrpic structure. It can be deposited in very thick layers which can then be converted into free-standing chapes. This is particularly useful for manufacturing thin walled and/or complicated graphite structures such as tubes, crucibles & cuvettes.
Pyrolytic carbon can be deposited directly onto metals such as nickel to provide an impervious chemical barrier whilst still being electrically conducting. This is potentially highly useful in fuel cell and elctronic applications.

He has extensive first-hand experience in the handling of tungsten hexafluoride and other toxic metal fluorides. He has used tungsten hexafluoride as a CVD precursor for producing tungsten layers. Besides its semiconductor uses CVD tungsten has many other uses. It can be deposited in very thick layers of up to several millimetres. This can be utilised to make free standing shapes of tungsten for which there are many applications such as sattelite/rocket thrusters, crucibles, thermowells, heating elements, projectiles etc.