Request Expert

Expert has experience with the design of applicator and antenna system for launching electromagnetic field (from 2.45 GHz to 105 GHz) for efficient plasma production and creative plasma diagnostics. He has extensive experience in design and development of electron cyclotron produced plasma system. Theoretical modeling of microwave propagation and absorption through electron cyclotron region in a plasma. Electron density measurement is very critical for plasma diagnostic and commercial application of plasma. He has expertise in plasma density measurement over large plasma pressure range. He has utilized probe diagnostics and millimeter wave interferometer for low pressure discharges and plasma emission spectroscopy for atmospheric pressure discharges. He has also developed a new application of millimeter wave interferometer for intermediate pressure range that has been cited for more than 20 times. He has experience in designing plasma systems for DC discharge, radio frequency, microwave frequency and laser produced discharged over a wide pressure range up to atmospheric pressure. These systems can be used for plasma emission spectroscopy, plasma remediation and other industrial application. Nature of feed gas is critical to the chemical efficiency of the plasma. Critical choice of gas is important for the nature of plasma application. He has experience of creating discharges with variety of gases, metal vapor including exotic gases and his expertise will be helpful in choosing right feed gas for particular application. Glow discharge plasma is used for variety of application including plasma emission spectroscopy source, remote plasma source for plasma remediation. He has considerable experience in modeling, designing and diagnosing these discharges that are of significant industrial application. High density gas discharges are used for plasma processing, plasma decontamination, and increased throughput of the process. His expertise over extensive period in this field that involves a detailed theoretical study, design and diagnosing of these sources enables me to provide a high quality consultancy in this area. Inductively coupled plasma are used for variety of industrial application as plasma torches, remote plasma creation, spectroscopy sources. He has designed, developed and operated variety of inductively coupled plasma sources. It includes design of antenna system- helical antenna, Double half-turn helix, Nagoya, Saddle type antenna, over wide range of chamber pressure- low pressure helicon system and atmospheric pressure plasma with operating power up to 25 kW.

Consulted IntelliResearch, Princeton for plasma diagnostics.Consulted INFN-LNS, Catania Italy as a visiting Scientist for the development of ECR Ions source.Consulted INFN-LNS for the development of Helicon plasma source for ion source and material processing application. Expert has experience with the design of applicator and antenna system for launching electromagnetic field (from 2.45 GHz to 105 GHz) for efficient plasma production and creative plasma diagnostics. He has extensive experience in design and development of electron cyclotron produced plasma system. Theoretical modeling of microwave propagation and absorption through electron cyclotron region in a plasma. Electron density measurement is very critical for plasma diagnostic and commercial application of plasma. He has expertise in plasma density measurement over large plasma pressure range. He has utilized probe diagnostics and millimeter wave interferometer for low pressure discharges and plasma emission spectroscopy for atmospheric pressure discharges. He has also developed a new application of millimeter wave interferometer for intermediate pressure range that has been cited for more than 20 times. He has experience in designing plasma systems for DC discharge, radio frequency, microwave frequency and laser produced discharged over a wide pressure range up to atmospheric pressure. These systems can be used for plasma emission spectroscopy, plasma remediation and other industrial application. Nature of feed gas is critical to the chemical efficiency of the plasma. Critical choice of gas is important for the nature of plasma application. He has experience of creating discharges with variety of gases, metal vapor including exotic gases and his expertise will be helpful in choosing right feed gas for particular application. Glow discharge plasma is used for variety of application including plasma emission spectroscopy source, remote plasma source for plasma remediation. He has considerable experience in modeling, designing and diagnosing these discharges that are of significant industrial application. High density gas discharges are used for plasma processing, plasma decontamination, and increased throughput of the process. His expertise over extensive period in this field that involves a detailed theoretical study, design and diagnosing of these sources enables me to provide a high quality consultancy in this area. Inductively coupled plasma are used for variety of industrial application as plasma torches, remote plasma creation, spectroscopy sources. He has designed, developed and operated variety of inductively coupled plasma sources. It includes design of antenna system- helical antenna, Double half-turn helix, Nagoya, Saddle type antenna, over wide range of chamber pressure- low pressure helicon system and atmospheric pressure plasma with operating power up to 25 kW.

Consulted IntelliResearch, Princeton for plasma diagnostics.

Consulted INFN-LNS, Catania Italy as a visiting Scientist for the development of ECR Ions source.

Consulted INFN-LNS for the development of Helicon plasma source for ion source and material processing application.