Request Expert

Expert has spent over 20 years developing mathematical algorithms, techniques and approaches to solve fundamental physics and engineering issues as well as model, analyse and/or design solutions to practical real world problems. He has a strong background in advanced mathematics, field theory, quantum field theory and all aspects of electromagnetic simulation. He is a expert in using Mathematica(TM) to develop and test algorithms and to generate numerical solutions to particular problems. He has also done significant work on statistics and probability as applied to a wide range of engineering and data analysis problems as well as on the fundamental mathematics of probability itself.

Spent 30 years working on all aspects of microlithographic chip fabrication. Everything from the design and development of lithographic tools, systems and subsystems to the analysis, simulation and optimization of lithographic fabrication techniques and processes. Worked at the Center for Nanoscale Science and Technology at the National Institute of Standards and Technology where I did design, development, analysis, simulation and modeling of essentially anything nano: nanotechnology, nanometrology, nanofabrication, nanoscience, etc. This covered such things as DNA origami binding to quantum dots as nanofabrication technique, the statistical limitations of block copolymer selfassembly for the semiconductor industry, the quantum mechanics of vortex electron beams and it's application to nanometrology, the optimal scan path for laser tracking of fluourescent nanoparticles and the statistics of patterning at EUV (13.5 nm) wavelengths for semiconductor chip fabrication.

He has spent over 20 years developing algorithms for performing optical and electromagnetic modeling and analysis in all areas of optics including diffraction, polarized diffraction, coherent and partially coherent imaging, interferometry, aberrations, flare, statistical optics, scattering, guided waves, surface plasmons, fiber optics, laser beam propagation and quantum optics. He has used propagators and Greens functions, including Feynman path integrals to compute diffraction in interferometric systems, laser doppler systems and gradient index optics. He has written exact electromagnetic solvers based on various techniques such as RCWA and eigenmode expansions for computing the scattering and diffraction from structured materials such as layered gratings, semiconductor wafers and optical masks.

He spent two years at Bell Labs working on the projection ebeam lithography tool know as SCALPEL. There he performed modeling, analysis and design in all aspects of the SCALPEL tool and on electron-beam lithography in general.


He performed diffraction and physical optics analysis of laser interferometry for an optical metrology company. The analysis included the effects of turbulence and helped the company improve their interferometers. He worked on the development of E&M simulation code for computing the topography of a structure from scanning white light interferometry signals. This analysis showed how to improve the translation of measured interferometry data into a surface topography map.He determined the origin, parametric dependencies and impact of speckle in projection imaging systems and it's impact on semiconductor chip fabrication. He derived from first principles a model which describes the origin and parametric scaling laws for line edge roughness in patterns produced in a chemically amplified photoresist during standard lithographic fabrication of computer and memory chips. This scaling law shows that lithographic resolution, line edge roughness and resist sensitivity are coupled in such a way that decreasing any two of those parameters requires the third to increase when the feature size is fixed. Unfortunately progress in chip fabrication requires that all three decrease simultaneously. The impossibility of simultaneous decrease of all three parameters is now know in the industry as the "RLS triangle" or more colloquially as "the triangle of death".He performed system engineering analysis of the effect of gas and fluid flow at low Knudsen numbers on heat transfer properties of structure.